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"High thermal stability of 850 nm VCSELs with enhanced mask margin up to 85 ..."
Hao-Tien Cheng, Yun-Cheng Yang, Chao-Hsin Wu (2021)
- Hao-Tien Cheng, Yun-Cheng Yang, Chao-Hsin Wu:
High thermal stability of 850 nm VCSELs with enhanced mask margin up to 85 °C for 100G-SR4 Operation. WOCC 2021: 49-53
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