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"High thermal stability of 850 nm VCSELs with enhanced mask margin up to 85 ..."

Hao-Tien Cheng, Yun-Cheng Yang, Chao-Hsin Wu (2021)

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DOI: 10.1109/WOCC53213.2021.9603055

access: closed

type: Conference or Workshop Paper

metadata version: 2023-09-30

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  dblp key:
  - conf/wocc/ChengYW21
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Hao-Tien Cheng, Yun-Cheng Yang, Chao-Hsin Wu:
High thermal stability of 850 nm VCSELs with enhanced mask margin up to 85 °C for 100G-SR4 Operation. WOCC 2021: 49-53

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