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ORCID"300 mm Wafer-scale In-situ CVD Growth Achieving 5.1×10-10 ..."
Haiwen Xu et al. (2022)
- Haiwen Xu, Rami Khazaka, Jishen Zhang, Zijie Zheng, Yue Chen, Xiao Gong:
300 mm Wafer-scale In-situ CVD Growth Achieving 5.1×10-10 Ω-cm2 P-Type Contact Resistivity: Record 2.5×1021 cm-3 Active Doping and Demonstration on Highly-Scaled 3D Structures. VLSI Technology and Circuits 2022: 367-368
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