Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"Scaled contact length with low contact resistance in monolayer 2D channel ..."

Wen-Chia Wu et al. (2023)

> Home

Details and statistics

DOI: 10.23919/VLSITECHNOLOGYANDCIR57934.2023.10185408

access: closed

type: Conference or Workshop Paper

metadata version: 2023-08-03

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/vlsit/WuHSFAHSCCLYQYL23
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/vlsit/WuHSFAHSCCLYQYL23
Wen-Chia Wu, Terry Y. T. Hung, D. Mahaveer Sathaiya, Dongxu Fan, Goutham Arutchelvan, Chen-Feng Hsu, Sheng-Kai Su, Ang-Sheng Chou, Edward Chen, Weisheng Li, Zhihao Yu, Hao Qiu, Ying-Mei Yang, Kuang-I Lin, Yun-Yang Shen, Wen-Hao Chang, San Lin Liew, Vincent D.-H. Hou, Jin Cai, Chung-Cheng Wu, Jeff Wu, H.-S. Philip Wong, Xinran Wang, Chao-Hsin Chien, Chao-Ching Cheng, Iuliana P. Radu:
Scaled contact length with low contact resistance in monolayer 2D channel transistors. VLSI Technology and Circuits 2023: 1-2

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.