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"Thickness-Engineered Extremely-thin Channel High Performance ITO TFTs with ..."

Yuye Kang et al. (2023)

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DOI: 10.23919/VLSITECHNOLOGYANDCIR57934.2023.10185421

access: closed

type: Conference or Workshop Paper

metadata version: 2023-07-28

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Yuye Kang, Kaizhen Han, Yue Chen, Xiao Gong:
Thickness-Engineered Extremely-thin Channel High Performance ITO TFTs with Raised S/D Architecture: Record-Low RSD, Highest Moblity (Sub-4 nm TCH Regime), and High VTH Tunability. VLSI Technology and Circuits 2023: 1-2

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