"Fluorine Plasma Treatment-Enabled ITO Transistors: Excellent Reliability ..."

Xuanqi Chen et al. (2024)

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DOI: 10.1109/VLSITECHNOLOGYANDCIR46783.2024.10631418

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type: Conference or Workshop Paper

metadata version: 2024-10-17

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Xuanqi Chen, Gan Liu, Wei Shi, Yuye Kang, Qiwen Kong, Yuxuan Wang, Rui Shao, Bich-Yen Nguyen, Gengchiau Liang, Kaizhen Han, Xiao Gong:
Fluorine Plasma Treatment-Enabled ITO Transistors: Excellent Reliability and Comprehensive Understanding of Temperature Dependence from 77K to 375K. VLSI Technology and Circuits 2024: 1-2

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