"Al/HfO2/Si Gate Stack with Improved Physical and Electrical Parameters."

Rakesh Prasher, Devi Dass, Rakesh Vaid (2016)

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DOI: 10.1109/VLSID.2016.71

access: closed

type: Conference or Workshop Paper

metadata version: 2023-03-24

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Rakesh Prasher, Devi Dass, Rakesh Vaid:
Al/HfO2/Si Gate Stack with Improved Physical and Electrical Parameters. VLSID 2016: 334-337

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