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"Robust test pattern generation for hold-time faults in nanometer technologies."

Yu-Hao Ho et al. (2017)

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DOI: 10.1109/VLSI-DAT.2017.7939647

access: closed

type: Conference or Workshop Paper

metadata version: 2017-06-20

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  dblp key:
  - conf/vlsi-dat/HoCCYL17
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  - https://dblp.org/rec/conf/vlsi-dat/HoCCYL17
Yu-Hao Ho, Yo-Wei Chen, Chih-Ming Chang, Kai-Chieh Yang, James Chien-Mo Li:
Robust test pattern generation for hold-time faults in nanometer technologies. VLSI-DAT 2017: 1-4

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