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"Fluorine improvement of MOSFET interface as revealed by RTS measurements ..."

Joo Hyung Kim et al. (2013)

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DOI: 10.1109/RWS.2013.6486653

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-24

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  - conf/rws/KimKLLKKYP13
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Joo Hyung Kim, Jung Joo Kim, Chang-Eun Lee, Jong Ho Lee, Dong Seok Kim, Nam Joo Kim, Kwang Dong Yoo, Heung-Soo Park:
Fluorine improvement of MOSFET interface as revealed by RTS measurements and HRTEM. RWS 2013: 97-99

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