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"Fluorine improvement of MOSFET interface as revealed by RTS measurements ..."
Joo Hyung Kim et al. (2013)
- Joo Hyung Kim, Jung Joo Kim, Chang-Eun Lee, Jong Ho Lee, Dong Seok Kim, Nam Joo Kim, Kwang Dong Yoo, Heung-Soo Park:
Fluorine improvement of MOSFET interface as revealed by RTS measurements and HRTEM. RWS 2013: 97-99
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