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"Technique for preparing defect-free high aspect ratio SU-8 resist ..."

Vijay K. Singh et al. (2011)

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DOI: 10.1109/NEMS.2011.6017397

access: closed

type: Conference or Workshop Paper

metadata version: 2020-09-10

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  - conf/nems/SinghMKMNH11
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Vijay K. Singh, Satoshi Maekawa, Megumi Katori, Yasuhito Minamiyama, Daiji Noda, Tadashi Hattori:
Technique for preparing defect-free high aspect ratio SU-8 resist structure using x-ray lithography. NEMS 2011: 479-482

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