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"CMOS-MEMS technology with front-end surface etching of sacrificial SiO2 ..."

J. Esteves et al. (2013)

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DOI: 10.1109/IWASI.2013.6576073

access: closed

type: Conference or Workshop Paper

metadata version: 2023-12-03

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  dblp key:
  - conf/iwasi/EstevesRBE13
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J. Esteves, Libor Rufer, Skandar Basrour, D. Ekeom:
CMOS-MEMS technology with front-end surface etching of sacrificial SiO2 dedicated for acoustic devices. IWASI 2013: 154-159

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