"Endpoint Detection of SiO2 Plasma Etching Using Expanded Hidden ..."

Sung-Ik Jeon et al. (2010)

> Home

Details and statistics

DOI: 10.1007/978-3-642-13318-3_58

access: closed

type: Conference or Workshop Paper

metadata version: 2025-03-03

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/isnn/JeonKHH10
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/isnn/JeonKHH10
Sung-Ik Jeon, Seung-Gyun Kim, Sang Jeen Hong, Seung Soo Han:
Endpoint Detection of SiO₂ Plasma Etching Using Expanded Hidden Markov Model. ISNN (2) 2010: 464-471

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.