"High temperature SOI CMOS technology and circuit realization for ..."

Holger Kappert et al. (2015)

> Home

Details and statistics

DOI: 10.1109/ISCAS.2015.7168845

access: closed

type: Conference or Workshop Paper

metadata version: 2020-10-25

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/iscas/KappertKDPK15
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/iscas/KappertKDPK15
Holger Kappert, Norbert Kordas, Stefan Dreiner, Uwe Paschen, Rainer Kokozinski:
High temperature SOI CMOS technology and circuit realization for applications up to 300°C. ISCAS 2015: 1162-1165

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.