"Front-plane and Back-plane Bias Temperature Instability of 22 nm Gate-last ..."

Yang Wang et al. (2020)

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DOI: 10.1109/IRPS45951.2020.9129093

access: closed

type: Conference or Workshop Paper

metadata version: 2022-07-25

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Yang Wang, Chen Wang, Tao Chen, Hao Liu, Chinte Kuo, Ke Zhou, Binfeng Yin, Lin Chen, Qing-Qing Sun:
Front-plane and Back-plane Bias Temperature Instability of 22 nm Gate-last FDSOI MOSFETs. IRPS 2020: 1-5

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