"Ferroelectric HfO2-based Capacitors for FeRAM: Reliability from Field ..."

Pramoda Vishnumurthy et al. (2024)

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DOI: 10.1109/IRPS48228.2024.10529299

access: closed

type: Conference or Workshop Paper

metadata version: 2024-08-04

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Pramoda Vishnumurthy, Ruben Alcala, Thomas Mikolajick, Uwe Schroeder, Luis Azevedo Antunes, Alfred Kersch:
Ferroelectric HfO2-based Capacitors for FeRAM: Reliability from Field Cycling Endurance to Retention (invited). IRPS 2024: 1-10

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