"Pre-O2 treatment for LNA gate oxide leakage improvement."

Zheng Ke et al. (2022)

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DOI: 10.1109/IRPS48227.2022.9764537

access: closed

type: Conference or Workshop Paper

metadata version: 2022-05-09

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  - conf/irps/KeGALLFMV22
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  - https://dblp.org/rec/conf/irps/KeGALLFMV22
Zheng Ke, Sachin Goyal, Solomon Arputharaj, Wendy Wee Yee Lau, Tan Tam Lyn, Lim Dau Fatt, Pandurangan Madhavan, Chandrasekar Venkataramani:
Pre-O2 treatment for LNA gate oxide leakage improvement. IRPS 2022: 39-1

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