"Interface Engineering of Trench-Ox for Modern DRAM Devices."

Soojung Hwang et al. (2024)

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DOI: 10.1109/IRPS48228.2024.10529421

access: closed

type: Conference or Workshop Paper

metadata version: 2024-05-29

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Soojung Hwang, Jongkyu Kim, Juntae Kim, Dahyun Cha, Minho Kim, Dongkyu Jang, Sunghak Cho, Seokhyang Kim, Jaeseong Park, Hyungjoon Kim, Sukwon Yu, Boyoung Song, Hyodong Ban:
Interface Engineering of Trench-Ox for Modern DRAM Devices. IRPS 2024: 1-4

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