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"Study of Lower Voltage Protection against Plasma Process Induced Damage by ..."

Yohei Hiura et al. (2020)

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DOI: 10.1109/IRPS45951.2020.9128947

access: closed

type: Conference or Workshop Paper

metadata version: 2020-07-30

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  dblp key:
  - conf/irps/HiuraMMMO20
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  - https://dblp.org/rec/conf/irps/HiuraMMMO20
Yohei Hiura, Shinichi Miyake, Shigetaka Mori, Koichi Matsumoto, Hidetoshi Ohnuma:
Study of Lower Voltage Protection against Plasma Process Induced Damage by Quantitative Prediction Technique. IRPS 2020: 1-5

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