"Impact of Al-based Dipole Formation on Gate Stack Integrity and Reliability."

Bruno Coppolelli et al. (2025)

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DOI: 10.1109/IRPS48204.2025.10983193

access: closed

type: Conference or Workshop Paper

metadata version: 2025-06-04

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Bruno Coppolelli, Davide Cornigli, Zheyuan Chen, Andrea Padovani, Sara Vecchi, Yanliu Dang, Luc Thomas, Luca Vandelli, Jianxin Lei, Naomi Yoshida, Renu Whig, Federico Nardi, Gaurav Thareja, Luca Larcher, Milan Pesic:
Impact of Al-based Dipole Formation on Gate Stack Integrity and Reliability. IRPS 2025: 1-8

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