Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"At the Extreme of 3D-NAND Scaling: 25 nm Z-Pitch with 10 nm Word Line Cells."

S. Rachidi et al. (2022)

> Home

Details and statistics

DOI: 10.1109/IMW52921.2022.9779303

access: closed

type: Conference or Workshop Paper

metadata version: 2023-06-19

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/imw2/RachidiAVDBKObR22
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/imw2/RachidiAVDBKObR22
S. Rachidi, Antonio Arreghini, Devin Verreck, G. L. Donadio, K. Banerjee, K. Katcko, Y. Oniki, G. Van den Bosch, Maarten Rosmeulen:
At the Extreme of 3D-NAND Scaling: 25 nm Z-Pitch with 10 nm Word Line Cells. IMW 2022: 1-4

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.