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"Atomistic simulations of plasma process-induced Si substrate damage - ..."

Asahiko Matsuda et al. (2013)

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DOI: 10.1109/ICICDT.2013.6563334

access: closed

type: Conference or Workshop Paper

metadata version: 2020-12-29

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Asahiko Matsuda, Yoshinori Nakakubo, Yoshinori Takao, Koji Eriguchi, Kouichi Ono:
Atomistic simulations of plasma process-induced Si substrate damage - Effects of substrate bias-power frequency. ICICDT 2013: 191-194

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