"Measurement and characterization of pattern dependent process variations ..."

Xiaoning Qi et al. (2006)

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DOI: 10.1145/1127908.1127914

access: closed

type: Conference or Workshop Paper

metadata version: 2018-11-06

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Xiaoning Qi, Alex Gyure, Yansheng Luo, Sam C. Lo, Mahmoud Shahram, Kishore Singhal:
Measurement and characterization of pattern dependent process variations of interconnect resistance, capacitance and inductance in nanometer technologies. ACM Great Lakes Symposium on VLSI 2006: 14-18

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