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"Ultrathin Ferroelectric Nondoped HfO2 for MFSFET with High-speed and ..."

Joong-Won Shin et al. (2022)

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DOI: 10.1109/DRC55272.2022.9855780

access: closed

type: Conference or Workshop Paper

metadata version: 2023-05-12

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  dblp key:
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Joong-Won Shin, Masakazu Tanuma, J. Pyo, Shun'ichiro Ohmi:
Ultrathin Ferroelectric Nondoped HfO2 for MFSFET with High-speed and Low-voltage Operation. DRC 2022: 1-2

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