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"Photo-oxidized HfS2 - An embeddable and writable high-k dielectric for ..."

Namphung Peimyoo et al. (2018)

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DOI: 10.1109/DRC.2018.8442164

access: closed

type: Conference or Workshop Paper

metadata version: 2020-10-25

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  dblp key:
  - conf/drc/PeimyooMBSAEAGR18
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  - https://dblp.org/rec/conf/drc/PeimyooMBSAEAGR18
Namphung Peimyoo, Jake Mehew, Matt D. Barnes, Adolfo De Sanctis, Iddo Amit, Janire Escolar, Konstantinos Anastasiou, Ali Gholina, Aidan P. Rooney, Sarah Haigh, Saverio Russo, Monica Felicia Craciun, Freddie Withers:
Photo-oxidized HfS2 - An embeddable and writable high-k dielectric for flexible Van der Waals nano-electronics. DRC 2018: 1-2

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