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"Low-Voltage Operation of MFSFET with Ferroelectric Nondoped HfO2 Formed by ..."

Shun'ichiro Ohmi et al. (2020)

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DOI: 10.1109/DRC50226.2020.9135170

access: closed

type: Conference or Workshop Paper

metadata version: 2021-06-11

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  - conf/drc/OhmiKKHM20
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Shun'ichiro Ohmi, Min Gee Kim, Masakazu Kataoka, Masaki Hayashi, Rengie Mark D. Mailig:
Low-Voltage Operation of MFSFET with Ferroelectric Nondoped HfO2 Formed by Kr/O2-Plasma Sputtering. DRC 2020: 1-2

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