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"Atomic Layer Etching (ALE) of WSe2 Yielding High Mobility p-FETs."

Ankur Nipane et al. (2019)

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DOI: 10.1109/DRC46940.2019.9046402

access: closed

type: Conference or Workshop Paper

metadata version: 2022-06-16

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  dblp key:
  - conf/drc/NipaneSJCBYHT19
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  - https://dblp.org/rec/conf/drc/NipaneSJCBYHT19
Ankur Nipane, Punnu Jose Sebastian, Younghun Jung, Min Sup Choi, Abhinandan Borah, Won Jong Yoo, James C. Hone, James T. Teherani:
Atomic Layer Etching (ALE) of WSe2 Yielding High Mobility p-FETs. DRC 2019: 231-232

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