"Creating an affordable 22nm node using design-lithography co-optimization."

Andrzej J. Strojwas et al. (2009)

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DOI: 10.1145/1629911.1629941

access: closed

type: Conference or Workshop Paper

metadata version: 2018-11-06

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Andrzej J. Strojwas, Tejas Jhaveri, Vyacheslav Rovner, Lawrence T. Pileggi:
Creating an affordable 22nm node using design-lithography co-optimization. DAC 2009: 95-96

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