"Compact modeling and robust layout optimization for contacts in deep ..."

Yongchan Ban, David Z. Pan (2010)

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DOI: 10.1145/1837274.1837375

access: closed

type: Conference or Workshop Paper

metadata version: 2018-11-06

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Yongchan Ban, David Z. Pan:
Compact modeling and robust layout optimization for contacts in deep sub-wavelength lithography. DAC 2010: 408-411

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