"MAP: MAsk-Pruning for Source-Free Model Intellectual Property Protection."

Boyang Peng et al. (2024)

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DOI: 10.1109/CVPR52733.2024.02226

access: closed

type: Conference or Workshop Paper

metadata version: 2024-10-04

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Boyang Peng, Sanqing Qu, Yong Wu, Tianpei Zou, Lianghua He, Alois Knoll, Guang Chen, Changjun Jiang:
MAP: MAsk-Pruning for Source-Free Model Intellectual Property Protection. CVPR 2024: 23585-23594

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