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"28nm metal-gate high-K CMOS SoC technology for high-performance mobile ..."

S. H. Yang et al. (2011)

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DOI: 10.1109/CICC.2011.6055355

access: closed

type: Conference or Workshop Paper

metadata version: 2023-10-06

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  dblp key:
  - conf/cicc/YangSICYLCLHHTWTYLWCCCCTCCCLLYSTLJDM11
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  persistent URL:
  - https://dblp.org/rec/conf/cicc/YangSICYLCLHHTWTYLWCCCCTCCCLLYSTLJDM11
S. H. Yang, J. Y. Sheu, M. K. Ieong, M. H. Chiang, T. Yamamoto, J. J. Liaw, S. S. Chang, Y. M. Lin, T. L. Hsu, J. R. Hwang, J. K. Ting, C. H. Wu, K. C. Ting, F. C. Yang, C. M. Liu, I. L. Wu, Y. M. Chen, S. J. Chent, K. S. Chen, J. Y. Cheng, M. H. Tsai, W. Chang, R. Chen, C. C. Chen, T. L. Lee, C. K. Lin, S. C. Yang, Y. M. Sheu, J. T. Tzeng, L. C. Lu, S. M. Jang, Carlos H. Diaz, Yuh-Jier Mii:
28nm metal-gate high-K CMOS SoC technology for high-performance mobile applications. CICC 2011: 1-5

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