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"A scaleable model for STI mechanical stress effect on layout dependence of ..."

Ke-Wei Su et al. (2003)

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DOI: 10.1109/CICC.2003.1249396

access: closed

type: Conference or Workshop Paper

metadata version: 2021-11-15

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  - conf/cicc/SuSLYLXCHCDH03
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  - https://dblp.org/rec/conf/cicc/SuSLYLXCHCDH03
Ke-Wei Su, Yi-Ming Sheu, Chung-Kai Lin, Sheng-Jier Yang, Wen-Jya Liang, Xuemei Xi, Chung-Shi Chiang, Jaw-Kang Her, Yu-Tai Chia, Carlos H. Diaz, Chenming Hu:
A scaleable model for STI mechanical stress effect on layout dependence of MOS electrical characteristics. CICC 2003: 245-248

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