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"EUV-CDA: Pattern shift aware critical density analysis for EUV mask layouts."

Abde Ali Kagalwalla et al. (2014)

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DOI: 10.1109/ASPDAC.2014.6742882

access: closed

type: Conference or Workshop Paper

metadata version: 2021-10-28

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  dblp key:
  - conf/aspdac/KagalwallaLAG14
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  - https://dblp.org/rec/conf/aspdac/KagalwallaLAG14
Abde Ali Kagalwalla, Michale Lam, Kostas Adam, Puneet Gupta:
EUV-CDA: Pattern shift aware critical density analysis for EUV mask layouts. ASP-DAC 2014: 155-160

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