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"Future electron-beam lithography and implications on design and CAD tools."

Jack J. H. Chen et al. (2011)

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DOI: 10.1109/ASPDAC.2011.5722222

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-26

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  dblp key:
  - conf/aspdac/ChenKCCL11
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  persistent URL:
  - https://dblp.org/rec/conf/aspdac/ChenKCCL11
Jack J. H. Chen, Faruk Krecinic, Jen-Hom Chen, Raymond P. S. Chen, Burn J. Lin:
Future electron-beam lithography and implications on design and CAD tools. ASP-DAC 2011: 403-404

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