"Limitations of using a normal-incidence, in-situ, optical growth rate ..."

Jon D. Burnsed, Steven P. DenBaars, Roy S. Smith (2003)

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DOI: 10.1109/CCA.2003.1223120

access: closed

type: Conference or Workshop Paper

metadata version: 2024-09-04

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Jon D. Burnsed, Steven P. DenBaars, Roy S. Smith:
Limitations of using a normal-incidence, in-situ, optical growth rate monitor for controlling nitride semiconductor deposition by metalorganic chemical vapor deposition. CCA 2003: 849-855

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