BibTeX record journals/mr/LauQHSCATS07

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@article{DBLP:journals/mr/LauQHSCATS07,
  author       = {W. S. Lau and
                  P. W. Qian and
                  Taejoon Han and
                  Nathan P. Sandler and
                  S. T. Che and
                  S. E. Ang and
                  C. H. Tung and
                  T. T. Sheng},
  title        = {Evidence that N\({}_{\mbox{2}}\)O is a stronger oxidizing agent than
                  O\({}_{\mbox{2}}\) for both Ta\({}_{\mbox{2}}\)O\({}_{\mbox{5}}\)
                  and bare Si below 1000degreeC and temperature for minimum low-K interfacial
                  oxide for high-K dielectric on Si},
  journal      = {Microelectron. Reliab.},
  volume       = {47},
  number       = {2-3},
  pages        = {429--433},
  year         = {2007},
  url          = {https://doi.org/10.1016/j.microrel.2006.05.018},
  doi          = {10.1016/J.MICROREL.2006.05.018},
  timestamp    = {Sat, 22 Feb 2020 19:28:13 +0100},
  biburl       = {https://dblp.org/rec/journals/mr/LauQHSCATS07.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}