BibTeX record journals/mr/KimLKLPK12

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@article{DBLP:journals/mr/KimLKLPK12,
  author       = {Dongwoo Kim and
                  Seonhaeng Lee and
                  Cheolgyu Kim and
                  Chiho Lee and
                  Jeongsoo Park and
                  Bongkoo Kang},
  title        = {Enhanced degradation of n-MOSFETs with high-k/metal gate stacks under
                  channel hot-carrier/gate-induced drain leakage alternating stress},
  journal      = {Microelectron. Reliab.},
  volume       = {52},
  number       = {9-10},
  pages        = {1901--1904},
  year         = {2012},
  url          = {https://doi.org/10.1016/j.microrel.2012.06.011},
  doi          = {10.1016/J.MICROREL.2012.06.011},
  timestamp    = {Tue, 18 Oct 2022 17:04:53 +0200},
  biburl       = {https://dblp.org/rec/journals/mr/KimLKLPK12.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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