BibTeX record journals/ibmrd/HinsbergHSW01

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@article{DBLP:journals/ibmrd/HinsbergHSW01,
  author       = {William D. Hinsberg and
                  Frances A. Houle and
                  Martha I. Sanchez and
                  Gregory M. Wallraff},
  title        = {Chemical and physical aspects of the post-exposure baking process
                  used for positive-tone chemically amplified resists},
  journal      = {{IBM} J. Res. Dev.},
  volume       = {45},
  number       = {5},
  pages        = {667--682},
  year         = {2001},
  url          = {https://doi.org/10.1147/rd.455.0667},
  doi          = {10.1147/RD.455.0667},
  timestamp    = {Fri, 13 Mar 2020 10:54:45 +0100},
  biburl       = {https://dblp.org/rec/journals/ibmrd/HinsbergHSW01.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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