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BibTeX record conf/sas2/LeeCHLHC19
@inproceedings{DBLP:conf/sas2/LeeCHLHC19, author = {Chen{-}Ju Lee and Liang{-}Chieh Chao and Kuo{-}Cheng Huang and Yu{-}Hsuan Lin and Min{-}Wei Hung and Chun{-}Han Chou}, title = {Two-Dimensional Irradiance Measurement System for Aligner Lithography}, booktitle = {{IEEE} Sensors Applications Symposium, {SAS} 2019, Sophia Antipolis, France, March 11-13, 2019}, pages = {1--4}, publisher = {{IEEE}}, year = {2019}, url = {https://doi.org/10.1109/SAS.2019.8705974}, doi = {10.1109/SAS.2019.8705974}, timestamp = {Wed, 16 Oct 2019 14:14:52 +0200}, biburl = {https://dblp.org/rec/conf/sas2/LeeCHLHC19.bib}, bibsource = {dblp computer science bibliography, https://dblp.org} }
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