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Gregory M. Wallraff

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Journal Articles

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2001
[j2]
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  - journals/ibmrd/HinsbergHSW01
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  persistent URL:
  - https://dblp.org/rec/journals/ibmrd/HinsbergHSW01
William D. Hinsberg, Frances A. Houle, Martha I. Sanchez, Gregory M. Wallraff:
Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists. IBM J. Res. Dev. 45(5): 667-682 (2001)
1997
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Robert D. Allen, Gregory M. Wallraff, Donald C. Hofer, Roderick R. Kunz:
Photoresists for 193-nm lithography. IBM J. Res. Dev. 41(1&2): 95-104 (1997)

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