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K. Y. Ee

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2005
[j2]
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  - journals/mr/TsangCKESLLW05
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  - https://dblp.org/rec/journals/mr/TsangCKESLLW05
C. F. Tsang, C. K. Chang, A. Krishnamoorthy, K. Y. Ee, Y. J. Su, H. Y. Li, W. H. Li, L. Y. Wong:
A study of post-etch wet clean on electrical and reliability performance of Cu/low k interconnections. Microelectron. Reliab. 45(3-4): 517-525 (2005)
2004
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C. F. Tsang, C. Y. Li, A. Krishnamoorthy, Y. J. Su, H. Y. Li, L. Y. Wong, W. H. Li, L. J. Tang, K. Y. Ee:
Impact of barrier deposition process on electrical and reliability performance of Cu/CVD low k SiOCH metallization. Microelectron. J. 35(9): 693-700 (2004)

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