Design of CMOS Device Process Sensor in 28 nm FD-SOI with 2 % of Frequency Spread.

Fri, 01 Jan 2021 00:00:00 +0100

Gowtham Peringattu Kalarikkal, Rohit Goel, Hitesh Shrimali:
Design of CMOS Device Process Sensor in 28 nm FD-SOI with 2 % of Frequency Spread. ICECS 2021: 1-6