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Ryuji Tomita

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2010 – 2019

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2013
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Ryuji Tomita, Hidehiko Kimura, M. Yasuda, K. Maeda, S. Ueno, T. Tomizawa, Y. Kunimune, H. Nakamura, M. Moritoki, Hiroshi Iwai:
Formation of high resistivity phases of nickel silicide at small area. Microelectron. Reliab. 53(5): 659-664 (2013)
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Ryuji Tomita, Hidehiko Kimura, M. Yasuda, K. Maeda, S. Ueno, T. Tonegawa, T. Fujimoto, M. Moritoki, Hiroshi Iwai:
Improvement on sheet resistance uniformity of nickel silicide by optimization of silicidation conditions. Microelectron. Reliab. 53(5): 665-669 (2013)

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