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F. L. Howland

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1970 – 1979

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1970
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F. L. Howland, K. M. Poole:
Device photolithography: An overview of the new mask-making system. Bell Syst. Tech. J. 49(9): 1997-2009 (1970)
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D. S. Alles, J. W. Elek, F. L. Howland, B. Nevis, R. J. Nielsen, W. A. Schlegel, J. G. Skinner, C. E. Stout:
Device photolithography: The step-and-repeat camera. Bell Syst. Tech. J. 49(9): 2145-2177 (1970)

1950 – 1959

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1955
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F. L. Howland:
Inelastic Behavior of Mild Steel Beams Subjected to Transverse Impact. University of Illinois Urbana-Champaign, USA, 1955

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