BibTeX records: V. Jaschke

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@inproceedings{DBLP:conf/icicdt/TriyosoJSMHSL12,
  author    = {D. H. Triyoso and
               V. Jaschke and
               Jeff Shu and
               S. Mutas and
               Klaus Hempel and
               Jamie K. Schaeffer and
               Markus Lenski},
  title     = {Robust {PEALD} SiN spacer for gate first high-k metal gate integration},
  booktitle = {{IEEE} International Conference on {IC} Design {\&} Technology,
               {ICICDT} 2012, Austin, TX, USA, May 30 - June 1, 2012},
  pages     = {1--4},
  publisher = {{IEEE}},
  year      = {2012},
  url       = {https://doi.org/10.1109/ICICDT.2012.6232870},
  doi       = {10.1109/ICICDT.2012.6232870},
  timestamp = {Mon, 22 Mar 2021 00:00:00 +0100},
  biburl    = {https://dblp.org/rec/conf/icicdt/TriyosoJSMHSL12.bib},
  bibsource = {dblp computer science bibliography, https://dblp.org}
}
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