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J.-Y. Tewg

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2006
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S. Chatterjee, Yue Kuo, J. Lu, J.-Y. Tewg, P. Majhi:
Electrical reliability aspects of HfO₂ high-k gate dielectrics with TaN metal gate electrodes under constant voltage stress. Microelectron. Reliab. 46(1): 69-76 (2006)

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