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| 3 | Chuan Jie Zhong, Hiroaki Tanaka, Shigetoshi Sugawa, Tadahiro Ohmi: High quality silicon nitride deposited by Ar/N2/H2/SiH4 high-density and low energy plasma at low temperature. Microelectronics Journal 37(1): 44-49 (2006) |
Selection of 1 from 5 records - Hiroaki Tanaka has 14 coauthors
Copyright © 2009-12-01 by Michael Ley (ley@uni-trier.de)