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Hiroaki Tanaka (Selection)

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3Electronic Edition pubzone.org CiteSeerX Google scholar BibTeX bibliographical record in XMLChuan Jie Zhong, Hiroaki Tanaka, Shigetoshi Sugawa, Tadahiro Ohmi: High quality silicon nitride deposited by Ar/N2/H2/SiH4 high-density and low energy plasma at low temperature. Microelectronics Journal 37(1): 44-49 (2006)

Selection of 1 from 5 records - Hiroaki Tanaka has 14 coauthors

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