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Masaru Sasago (Selection)

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2Electronic Edition pubzone.org CiteSeerX Google scholar BibTeX bibliographical record in XMLYoshihiko Hirai, Sadafumi Tomida, Kazushi Ikeda, Masaru Sasago, Masayuki Endo, Sigeru Hayama, Noboru Nomura: Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system). IEEE Trans. on CAD of Integrated Circuits and Systems 10(6): 802-807 (1991)
1Electronic Edition pubzone.org CiteSeerX Google scholar BibTeX bibliographical record in XMLYoshihiko Hirai, Masaru Sasago, Masayuki Endo, K. Tsuji, Yojiro Mano: Process Modeling for Photoresist Development and Design of DLR/sd (Double-Layer Resist by a Single Development) Process. IEEE Trans. on CAD of Integrated Circuits and Systems 6(3): 403-409 (1987)

Selection of 2 from 2 records - Masaru Sasago has 8 coauthors

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