K. L. Ng (Selection)

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2 Nian Zhan, M. C. Poon, Hei Wong, K. L. Ng, Chi-Wah Kok: Dielectric breakdown characteristics and interface trapping of hafnium oxide films. Microelectronics Journal 36(1): 29-33 (2005)

1 K. L. Ng, Nian Zhan, Chi-Wah Kok, M. C. Poon, Hei Wong: Electrical characterization of the hafnium oxide prepared by direct sputtering of Hf in oxygen with rapid thermal annealing. Microelectronics Reliability 43(8): 1289-1293 (2003)

Selection of 2 from 6 records - K. L. Ng has 7 coauthors

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2		Nian Zhan, M. C. Poon, Hei Wong, K. L. Ng, Chi-Wah Kok: Dielectric breakdown characteristics and interface trapping of hafnium oxide films. Microelectronics Journal 36(1): 29-33 (2005)
1		K. L. Ng, Nian Zhan, Chi-Wah Kok, M. C. Poon, Hei Wong: Electrical characterization of the hafnium oxide prepared by direct sputtering of Hf in oxygen with rapid thermal annealing. Microelectronics Reliability 43(8): 1289-1293 (2003)