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| 1 | J. Mar, Krish Bhargavan, Steven G. Duvall, Ram Firestone, Dennis J. Lucey, S. N. Nandgaonkar, S. Wu, Kaung-Shia Yu, F. Zarbakhsh: EASE--An Application-Based CAD System for Process Design. IEEE Trans. on CAD of Integrated Circuits and Systems 6(6): 1032-1038 (1987) |
Selection of 1 from 1 records - Dennis J. Lucey has 8 coauthors
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