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C. Richard Guarnieri (Selection)

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1Electronic Edition pubzone.org CiteSeerX Google scholar BibTeX bibliographical record in XMLDavid R. Medeiros, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee Kwong, Christopher K. Magg, Arpan P. Mahorowala, Wayne M. Moreau, Karen E. Petrillo, Marie Angelopoulos: Recent progress in electron-beam resists for advaced mask-making. IBM Journal of Research and Development 45(5): 639-650 (2001)

Selection of 1 from 1 records - C. Richard Guarnieri has 9 coauthors

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