BibTeX record journals/tim/TayHWC09

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@article{DBLP:journals/tim/TayHWC09,
  author       = {Arthur Tay and
                  Weng Khuen Ho and
                  Xiaodong Wu and
                  Xiaoqi Chen},
  title        = {In Situ Monitoring of Photoresist Thickness Uniformity of a Rotating
                  Wafer in Lithography},
  journal      = {{IEEE} Trans. Instrum. Meas.},
  volume       = {58},
  number       = {12},
  pages        = {3978--3984},
  year         = {2009},
  url          = {https://doi.org/10.1109/TIM.2009.2021620},
  doi          = {10.1109/TIM.2009.2021620},
  timestamp    = {Mon, 03 Jan 2022 22:05:00 +0100},
  biburl       = {https://dblp.org/rec/journals/tim/TayHWC09.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}

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